In this study, we demonstrate that the Zr incorporation route governs not only dopant distribution but also precursor crystallographic growth and cathode texture development in Ni-rich layered cathodes. Comprehensive physicochemical characterization revealed that the precursor-stage, in situ Zr-incorporated cathode (NCMZr-c) exhibited a homogeneous Zr distribution throughout the secondary particles and a distinct crystallographic texture favored by precursor-stage Zr-mediated growth regulation, in contrast to the post-solid-state Zr-incorporated cathode (NCMZr-p). These features synergistically mitigated anisotropic lattice contraction, alleviated localized strain accumulation, and preserved lithium-ion transport kinetics during repeated high-voltage cycling up to 4.5 V. Consequently, NCMZr-c retained 96.7% and 86.4% of its initial capacity after 100 cycles at 4.3 and 4.5 V, respectively, at a 1C rate. Post-cycling transmission electron microscopy revealed a markedly thinner rocksalt-like surface layer for NCMZr-c (~3 nm) than for pristine NCM (~13 nm), together with substantially suppressed intergranular cracking. This study establishes precursor-stage Zr incorporation as an effective approach for coupling dopant distribution control with crystallographic texture regulation, providing a useful insight into designing doping strategies to enhance the structural stability of Ni-rich layered oxide cathodes.